Department of Physics Research Facilities

Network Analyser Deposition Systems Furnaces Optical Characterisation General Facilities

Network Analyzer with Spectrum Analyzer (Anritsu MS2038C)

 

Deposition Systems

1. Physical Vapour Deposition (PVD) Unit, To deposit metal films and for metal contacts
2. Chemical Vapour deposition (CVD) Unit , With three zone furnace 1200 ^oC
3. Successive ionic layer adsorption and reaction (SILAR) deposition system
4. Spin Coater

Furnaces

1. Muffle Furnace, 1200 ^oC
2. Tubular Furnace, Two Zone: 1200 ^oC, side loading
3. Tubular Furnace, Single zone, 1200 ^oC, vertical loading

Optical Characterisation

1. Compact Hi-Sensitive Spectrometer, Wavelength range: 200nm to 1100nm, for transmission, absorption and reflection.
2. Monochromator, Wavelength: 300 nm to 700 nm, FWHM less than 8 nm
3. Red Blue and Green lasers (635nm+520nm+445nm) with variable power upto 1 W
4. Xenon Lamp  (Power: 100W)
5. Electrical Characterisation
6. Source Measuring Unit (SMU) from Keithley
7. LCR meter

General Facilities

1. Hood for wet chemistry
2. High Speed Centrifuge
3. Ultrasonic cleaner
4. Probe Sonicator
5. Electromagnet with power supply
6. Laser Interferometry
7. Digital Storage Oscilloscope
8. Oven for drying
9. Other minor equipments include micropipettes, magnetic stirrer, hot plates, weighing balance, gas cylinders (Argon, Oxygen), etc.